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CMSH uses MPCVD equipment to achieve epitaxial growth of polycrystalline diamond material with a thickness of<10um on a 50.8 mm (2 inch) silicon-based gallium nitride HEMT. Scanning electron microscope and X-ray diffractometer were used to characterize the surface morphology, crystalline quality and grain orientation of the diamond film. The results showed that the surface morphology of the sample was relatively uniform, and the diamond grains basically showed (111) plane growth, with Higher crystal plane orientation. In the growth process, the etching of gallium nitride (GaN) by hydrogen plasma is effectively avoided, so that the characteristics of gallium nitride before and after diamond coating do not change significantly.
CSMH successfully has acheived high-quality AlN (AlN) thin films on silicon substrates, XRD (0002) rocking curve < 0.8°, and surface roughness Ra < 1.5 nm on the growth surface, high-quality AlN films help GaN for large size, high quality and low cost.
High-quality AlN On Sapphire (sapphire-based AlN) produced by CSMH shows XRD (0002) rocking curve<0.05° and surface roughness Ra<1.2nm of growth surface. CSMH has performed extensive the quality controls and improved the product quality. Our quality controls ensure product stability while reducing product costs and shortening production cycle. Customer verification shows that CSMH's high-quality AlN On Sapphire can significantly improve the yield, stability, and performance of UVC LED products.
CSMH firstly innovated the technology of diamond-based AlN with XRD (0002) rocking curve<3°, ultra-high thermal conductivity of diamond (thermal conductivity at room temperature can reach 2000W/m.K), Ra <2nm, contributing to a brand new application of AlN.
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